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INTERNATIONAL PATENT: NGK INSULATORS, LTD., 日本碍子株式会社 FILES APPLICATION FOR "THERMAL INSULATION MATERIAL AND THERMAL INSULATION MATERIAL PRODUCTION METHOD"

GENEVA, Feb. 23 -- NGK INSULATORS, LTD. (2-56 Suda-cho, Mizuho-ku, Nagoya-shi, Aichi4678530), 日本碍子株式会社 (愛知県名古... Read More


INTERNATIONAL PATENT: MINEBEA MITSUMI INC., ミネベアミツミ株式会社 FILES APPLICATION FOR "REACTION FORCE GENERATOR"

GENEVA, Feb. 23 -- MINEBEA MITSUMI INC. (4106-73 Oaza Miyota, Miyota-machi, Kitasaku-gun, Nagano3890293), ミネベアミツミ株式会社 (&#38... Read More


INTERNATIONAL PATENT: TAIYO HOLDINGS CO., LTD., 太陽ホールディングス株式会社 FILES APPLICATION FOR "RESIN COMPOSITION, CURED PRODUCT AND ELECTRONIC COMPONENT"

GENEVA, Feb. 23 -- TAIYO HOLDINGS CO., LTD. (388, Oaza Okura, Ranzan-machi, Hiki-gun, Saitama3550222), 太陽ホールディングス株式&... Read More


INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING DEVICE"

GENEVA, Feb. 23 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東&#2... Read More


INTERNATIONAL PATENT: ALPS ALPINE CO., LTD., アルプスアルパイン株式会社 FILES APPLICATION FOR "SHIFT DEVICE"

GENEVA, Feb. 23 -- ALPS ALPINE CO., LTD. (1-7, Yukigaya-otsukamachi, Ota-ku, Tokyo1458501), アルプスアルパイン株式会社 (&#... Read More


INTERNATIONAL PATENT: DAIKIN INDUSTRIES, LTD., ダイキン工業株式会社 FILES APPLICATION FOR "COMPOSITION CONTAINING 1,1,1,2-TETRAFLUOROETHANE AND METHOD FOR STORING SAME"

GENEVA, Feb. 23 -- DAIKIN INDUSTRIES, LTD. (Osaka Umeda Twin Towers South, 1-13-1, Umeda, Kita-ku, Osaka-Shi, Osaka5300001), ダイキン工業株式会&#3... Read More


INTERNATIONAL PATENT: AGC INC., AGC株式会社 FILES APPLICATION FOR "INORGANIC SUBSTRATE FOR SEMICONDUCTOR"

GENEVA, Feb. 23 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), AGC株式会社 (東京都千代田区&#200... Read More


INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "PREDICTION METHOD, PLASMA PROCESSING DEVICE, MODEL GENERATION METHOD AND INFORMATION PROCESSING DEVICE"

GENEVA, Feb. 23 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東&#2... Read More


INTERNATIONAL PATENT: CENTRAL GLASS COMPANY, LIMITED, セントラル硝子株式会社 FILES APPLICATION FOR "METHOD FOR REDUCING DIELECTRIC CONSTANT AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE"

GENEVA, Feb. 23 -- CENTRAL GLASS COMPANY, LIMITED (5253, Oaza Okiube, Ube-shi, Yamaguchi7550001), セントラル硝子株式会社 (山&#21... Read More


INTERNATIONAL PATENT: SHIN-ETSU HANDOTAI CO., LTD., 信越半導体株式会社 FILES APPLICATION FOR "MANAGEMENT METHOD OF SURFACE DEFECT INSPECTION DEVICE AND STANDARD WAFER"

GENEVA, Feb. 23 -- SHIN-ETSU HANDOTAI CO., LTD. (2-1, Ohtemachi 2-chome, Chiyoda-ku, Tokyo1000004), 信越半導体株式会社 (東京都&#... Read More